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Influence of sputter gas pressure and substrate bias on intrinsic stress and crystallinity of coatings produced by magnetron sputtering / V. Teixeira and M. Andritschky
Main Author Teixeira, Vasco M. P. Coauthor Andritschky, M. Country Holanda. Analytic , p. 121-127 CDU 538.975| Item type | Current location | Call number | Status | Date due | Barcode | Item holds |
|---|---|---|---|---|---|---|
| Monografia | Biblioteca de Reservados | BRE 538.975 | Não requisitável | Not for loan | 122702 | ||
| Monografia | Biblioteca de Reservados | BREG 538.975 | Não requisitável | Not for loan | 149337 |
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