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Direct current reactive magnetron sputtered zinc oxide thin films - the effect of the sputtering pressure / Li-Jian Meng and M. P. dos Santos
Main Author Santos, Manuel Armando Oliveira Pereira dos Coauthor Li-Jian Meng Country Suiça. Analytic , Nº250 (1994), p. 26-32 CDU 539.23| Item type | Current location | Call number | Status | Date due | Barcode | Item holds |
|---|---|---|---|---|---|---|
| Monografia | Biblioteca de Reservados | BRE 539.23 | Não requisitável | Not for loan | 148941 |
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