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The influence of oxygen partial pressure and total pressure (O2+Ar) on the properties of thin oxide films prepared by dc sputtering / Li-Jian Meng and M. P. dos Santos
Main Author Santos, Manuel Armando Oliveira Pereira dos Coauthor Li-Jian Meng Country Reino Unido. Analytic , V.45, nº12 (1994), p. 1191-1195 CDU 539.23| Item type | Current location | Call number | Status | Date due | Barcode | Item holds |
|---|---|---|---|---|---|---|
| Monografia | Biblioteca de Reservados | BRE 539.23 | Não requisitável | Not for loan | 148937 |
Total holds: 0
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