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Deposition and properties of titanium nitride films produced by dc reactive magnetron sputtering / Li-Jiang Meng, A. Azevedo and M. P. dos Santos
Main Author Santos, Manuel Armando Oliveira Pereira dos Coauthor Li-Jian MengAzevedo, A. Country Reino Unido. Analytic , V.46, nº3 (1995), p. 233-239 CDU 539.23
| Item type | Current location | Call number | Status | Date due | Barcode | Item holds |
|---|---|---|---|---|---|---|
| Monografia | Biblioteca de Reservados | BRE 539.23 | Não requisitável | Not for loan | 148936 |
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